Microscopic ATR measurement of thin polyimide film on silicon substrates

The micro-ATR method, which can measure in situ, is extremely convenient for measuring the processing film on the surface of microelectronic components.
The following is as example of measuring a thin polyimide film on a silicon substrate (300 um thick), which is normally somewhat difficult to do. Fully keeping the sample surface and prism surface in contact without destroying the fragile silicon substrate requires that the packing on which the sample is placed be horizontal. Failing to do so will damage the substrate. In this example, Jasco used Parafilm, which is thin and has elasticity, as the packing material to successfully measure the silicon substrate.